Influence of Crystalline Si Solar Cell by Rie Surface Texturing
نویسندگان
چکیده
منابع مشابه
RIE-Texturing of Multicrystalline Silicon Solar Cells
We developed a maskless plasma texturing technique for multicrystalline silicon (mc-Si) cells using Reactive Ion Etching (RIE) that results in higher cell performance than that of standard untextured cells. Elimination of plasma damage has been achieved while keeping front reflectance to extremely low levels. Internal quantum efficiencies as high as those on planar cells have been obtained, boo...
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A maskless plasma textu~ring technique using Reactive Ion Etching for silicon solar cells results in a very low reflectance of 5.4 % before and 3.9 % after SiN deposition. A detailed study of surface recombination and emitter properties was made, then solar cells were fabricated using the DOSS solar cell process. Different plasmadamage removal treatments are tested to optimize low lifetime sola...
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This work is focused on plasma-induced texturing using a single chamber inductively coupled plasma – plasma-enhanced chemical vapour deposition (ICP-PECVD) lab-tool. Plasma treatment using pure NF3 under low pressure conditions leads to high etch rates (1.2–1.4 μm/min) enabling fast surface texturing. 6 min plasma treatment on wafers with saw damage decreases the effective reflectivity Reff fro...
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ژورنال
عنوان ژورنال: Journal of the Korean Vacuum Society
سال: 2010
ISSN: 1225-8822
DOI: 10.5757/jkvs.2010.19.4.314